LAVA is a web technology that allows lithographers around the globe to access lithography simulators remotely through the Internet. 
Through LAVA, technologists can utilize the SPLAT, SAMPLE, TEMPEST, and SIMPLe simulators, which have been developed at UC Berkeley for optical lithography simulation.

LAVA has several major advantages over the conventional simulation tools.

First, LAVA enables access to simulation tools through web browsers or a Java application running at a remote location. LAVA maintain, and upgrade simulation codes locally on various platforms. With LAVA, the technologists simply interacts with a web page, including local plotting and save/load of results.

Second, LAVA provides a rich graphical web environment in which it is easy (and fun) to create custom interfaces for each physical application. The technologist no longer needs to learn all the input commands of formats and instead can select masks, exposure tools, and drag and drop defects.


About Volcano

Access our simulators

The main purpose of our web server cluster is to provide a fast and stable simulation server, combining our best resources and latest codes. Currently, we have 5 simulators online, SPLAT, SAMPLE-2D, SAMPLE-3D, TEMPEST, and SIMPL:

SPLAT is a FORTRAN program, based on the Hopkins theory of partially coherent imaging, that simulates two-dimensional projection-printing with partial coherence.

SAMPLE-2D is a FORTRAN program for Simulation and Modeling of Profiles in Lithography and Etching. It is capable of simulating the time evolution of topographical features of integrated circuit devices during multiple process steps.

SAMPLE-3D is a program for simulating lithography and topography in three dimensions. This simulator calculates aerial images, and simulates exposure, development, etching and deposition.

TEMPEST stands for "Time-domain Electromagnetic Massively Parallel Evaluation of Scattering from Topography". It is a C program that solves Maxwell's equations using a time-domain finite-difference algorithm.

SIMPL System 6 (SIMulation of Profiles from the Layout) is a collection of software for generating device cross-sections from layout and process flow information. SIMPLer - simplified version of SIMPL developed for EE40.

SIMPL GL - new version of SIMPL and SIMPL-DIX for 3D Layout viewing and more advanced cross-section (profile) generation.

Access our physical applications

We will be having a series of physical application sites that are specialized applications of our simulators to specific types of physical effects.

Browse online material

We have put simulator user manuals online for easy access.

Download programs

We generally do not let users download programs from our site, except for some special occasions

Register for an account

Users who want to have more access privileges like running very large simulations, storing results, etc, are required to register. (this is not necessary now)

Contact us

You are very welcome to contact us about any questions, suggestions, bug reports, etc.